Scalable fabrication of high performance absorber based on colloid sphere lithography technology

Abstract

The perfect absorbers have attracted many attentions in recent years for their unusual property in absorbing the incident light, and own many potential applications in many fields, such as the selective thermal emitters, spectrally sensitive detectors and sensors. In this paper, we report a simple, low-cost and highly-efficient method for the fabrication of large area (>1cm2) high-performance absorber working in visible and near-infrared region based on the colloid sphere lithography technology. The absorber reported here is composed of glass substrate, silver triangle nanoparticle array, dielectric layer and silver slab. The theoretical analysis based the finite difference time domain method (FDTD) indicates that an ideal absorption efficiency of about 100% can be achieved at any desired wavelength. In experiment, a perfect absorber working at 752nm has been fabricated. The measured results meet well with the simulations, and demonstrate the high performance of the proposed absorber. The low-cost, high-efficiency fabrication method and the high performance pave the way for the application of the absorber proposed in this paper.