Saturated laser of Ne-like argon and Xe-based extreme ultraviolet source radiated from capillary discharge plasma

Abstract

In this paper, we report the saturated soft x-ray laser at 46.9nm in Ne-like Ar ions and extreme ultraviolet source at 13.5nm in Xe10+ ions emitted from capillary discharge plasma. The 46.9nm laser is achieved with the initial pressure between 16Pa and 32Pa. The saturated laser is obtained with peak current of 20kA and initial pressure of 26Pa. The small signal gain coefficient of 0.6cm−1 is measured. In the other capillary discharge device, the extreme ultraviolet (EUV) lithography light source at 13.5 nm is realized with Xe10+. The source is driven by pulse current of 35kA and pulse duration of 132ns.