Abstract
This paper concerns negative-tone water-soluble resists containing amylopectin and amylose derivatives for safety-oriented photolithography of edible pharmaceutical polymer films that can be used in drug capsules and enteric coating materials. Organic developers and solvents contained in commonly used resists cause damage and contamination between the resist and pharmaceutical polymer films in the resist coating, and during photolithographic development. An optimized resist formulation and photosensitivity led to well-patterned 450 nm lines on hydroxypropyl methylcellulose at an exposure wavelength of 360–375 nm and acceptable etch resistance to CF4 for anti-counterfeiting of pharmaceutical products.
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