Abstract
An Ion beam sputtering device and Ti/Ni composite target were used in order to fabricate Ti-Ni alloy thin film. After sputtering, vacuum annealing treatment was performed in order to obtain the crystallized Ti-Ni alloy thin film. The microstructure and composition of the film was analyzed by X-ray diffractmeter and energy dispersive X-ray spectrometry. As the results, it was confirmed that the amorphous Ti-Ni alloy thin film can be obtained by the method. Also, it was confirmed that the composition of the film can be controlled by sputtering condition. In addition, it was found that the thin film exhibits high hardness. Furthermore, it was found that the thin film has superior peel resistance.
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