Abstract
Ruthenium is electrodeposited for the first time from a deep eutectic solvent based electrolyte composed of ethylene glycol and choline chloride in 1:2 molar ration. Deposition is found to effectively occur upon addition of sulfamic acid to the Ru(III) containing deep eutectic solvent. Optimized plating conditions are able to yield uniform and crack-free coatings up to 800 nm thickness. No oxides or other notable secondary phases can be individuated in the obtained metallic layers.
Highlights
Ruthenium, a transition metal belonging to the same group of platinum,[1] is used nowadays in many different industrial applications: decorative and corrosion resistant coatings, wear protection for electrical contacts[2,3] and interdiffusion barrier layers.[4,5] interesting catalytic properties have been demonstrated for this bright white metal both in its metallic form[6] and as oxide.[7]
Ru deposition optimization.—Initially, galvanostatic ruthenium electrodeposition was attempted from a mixture of Choline chloride (ChCl)/ethylene glycol (EG) and 40 mM RuCl3
Copper was used as substrate and current density was varied over a broad range, but no reproducible ruthenium plating was achieved
Summary
A transition metal belonging to the same group of platinum,[1] is used nowadays in many different industrial applications: decorative and corrosion resistant coatings, wear protection for electrical contacts[2,3] and interdiffusion barrier layers.[4,5] interesting catalytic properties have been demonstrated for this bright white metal both in its metallic form[6] and as oxide.[7]. Ruthenium electrodeposition typically takes place from aqueous sulfamate based electrolytes containing the metal in the form of a bridged complex known as μ-nitridobisaquatetrachlororuthenate [Ru2(μ-N)(H2O)2Cl8].14–16 Deposition from these baths is characterized by a good cathodic efficiency (exceeding 90%) and by crack-free deposits up to 1–2 μm thickness. The aim of the present paper is the investigation of ruthenium electrodeposition from a DES obtained mixing choline chloride and ethylene glycol in 1:2 molar ratio This DES, belonging to the class III and commercially known as ethaline, is characterized by interesting physical and chemical properties and it constitutes a good electrolyte for the deposition of many metals. RuCl3 in different amounts (20 or 40 mM) was added to form the plating solution, which
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.