Abstract
Footprint scaling may reduce wire lengths when more metal layers are available for routing. To achieve optimal wire length, footprint should be very small in which case pin density will be extremely high. However, high pin density may lead to detailed routing failure. We demonstrate that there is a threshold pin density beyond which standard routing heuristics fail to access pins on the bottom layer, even with unlimited number of metal layers available for routing. Future technologies, such as vertical slit field-effect transistor (VeSFET), may have layouts with pin density exceeding the threshold. We show that VeSFET layouts are still routable within footprint using two-sided routing. Compared to one-sided routing, two-sided routing achieves shorter wire lengths and fewer vias, hence lower interconnect capacitance and better performance.
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