Abstract
In this work, a phenomenological approach is proposed to analyze the electrical transport through an insulating barrier in insulating/metallic bilayer systems using conductive atomic force microscopy. The influence of the substrate in the electrical properties of ferroelectric/ferromagnetic bilayers was studied in the frame of this model. The substrate roughness was found to increase the barrier height distribution and increase the attenuation length in the material, reducing the barrier quality for the developing of multiferroic tunnel junctions.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
