Abstract
The aim of this paper is to examine the coarsening process in the evolution of the surface morphology during molecular beam epitaxy (MBE). A numerical approach for modeling the evolution of surface roughening in film growth by MBE is proposed. The model is based on the nonlinear differential equations by Kuramoto–Sivashinsky (KS) namely, KS and CKS (conserved KS). In particular, we propose a “combined version” of KS and CKS equations, which is solved as a function of a parameter r for the 1 + 1 dimensional case. The computation provides film height as a function of space and time. From this quantity the change of the width of the film over time has numerically been studied as a function of r. The main result of the research is that the surface width is exponentially increasing with increasing time and the change in surface width for smaller r values is significantly greater over longer time interval.
Highlights
One of the great challenges of physics and materials science is to understand the growth and surface morphology of the interfaces, both in nature and in technological applications
A recently developed, highly active field of research in statistical physics is dealing with the understanding of surface growth processes [1,2,3,4,5,6,7,8,9]
Several growth models have been introduced in the literature, the understanding of growth processes is very important
Summary
One of the great challenges of physics and materials science is to understand the growth and surface morphology of the interfaces, both in nature and in technological applications. The industrial application of coating processes allows thin layers with prescribed properties to be formed on a solid substrate [2]. The technique of growth surfaces under MBE has received considerable attention for a wide range of technological and industrial applications. This approach provides unique capability to grow crystalline thin films with precise control of thickness, composition and morphology. This enables scientists to build nanostructures as pyramidal or mound-like objects. The extraordinary richness of pattern forming during MBE is determined by processes which occur locally at the surface
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