Abstract

Light emitting diodes (LEDs) in the mid-infrared (MIR) spectral range require material systems with tailored optical absorption and emission at wavelengths λ > 2 μm. Here, we report on MIR LEDs based on In(AsN)/(InAl)As resonant tunneling diodes (RTDs). The N-atoms lead to the formation of localized deep levels in the In(AsN) quantum well (QW) layer of the RTD. This has two main effects on the electroluminescence (EL) emission. By electrical injection of carriers into the N-related levels, EL emission is achieved at wavelengths significantly larger than for the QW emission (λ ∼ 3 μm), extending the output of the diode to λ ∼ 5 μm. Furthermore, for applied voltages well below the flatband condition of the diode, EL emission is observed at energies much larger than those supplied by the applied voltage and/or thermal energy, with an energy gain ΔE > 0.2 eV at room temperature. We attribute this upconversion luminescence to an Auger-like recombination process.

Highlights

  • D (MIR) spectral range of the electromagnetic spectrum.1–3 it is of paramount importance to develop materials and devices that can operate at these wavelengths

  • The N-atoms lead to the formation of localized deep levels in the In(AsN) quantum well (QW) layer of the resonant tunneling diodes (RTDs)

  • For applied voltages well below the flatband condition of the diode, EL emission is observed at energies much larger than those supplied by the applied voltage and/or thermal energy, with an energy gain DE > 0.2 eV at room temperature

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Summary

Introduction

D (MIR) spectral range of the electromagnetic spectrum (wavelength k 1⁄4 2–20 lm).1–3 it is of paramount importance to develop materials and devices that can operate at these wavelengths. By increasing the N-content by up to [N] 1⁄4 3%, the bandgap can be reduced by $25%.18,19 The N-incorporation creates zero-dimensional states in the forbidden bandgap that are localized on nanometer length-scales.20 In this work, we report on the room temperature operation of a resonant tunneling diode (RTD) based on the dilute nitride alloy In(AsN) as a MIR emitter.

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