Abstract
Abstract The oxidation at 300° K of high purity iron surfaces prepared under ultra-high-vacuum conditions was studied using ellipsometry to measure film thickness. By working at low oxygen pressures (between 10−7 and 10−4 torr) it was found that the early stages of the oxidation process followed a linear growth law with rate being proportional to the pressure. This behavior is in agreement with a picture proposed by Cabrera. The sticking probability of oxygen in the pressure range studied was of the order of 5 × 10−3 Traces of water vapor lowered the limiting film thickness approached in the latter, nonlinear, oxidation stage to 18 A from the 26 A found at all pressures for dry oxygen.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
