Abstract

Ferroelectrics of simple oxides have been of great interest due to they are easy to integrate with silicon semiconductors. The FE hysteresis loop was measured for the first time in pure anatase-phase titanium dioxide is reported, demonstrating that the ferroelectric-like behavior in a-TiO2 epitaxial thin films (7.5 nm to 228.8 nm) prepared by chemical solution deposition method on (001) SrTiO3 based substrates. Synchrotron based X-ray diffraction and reciprocal space mapping analysis prove that we have prepared high-quality epitaxial films. According to the results of the FE hysteresis loop, Pr can reach approximately 0.42 μC/cm2 in a-TiO2 film with a thickness of 14.5 nm. Furthermore, the PFM shows that the ferroelectric-like behavior is exhibited in a-TiO2 film of 7.5 nm and that the PFM polarization switch can be maintained for more than 100 min. All of these seem to indicate the presence of ferroelectric behavior in a-TiO2 films. We recognize that the origin of ferroelectric-like behavior is due to the distortion induced by strain and vacancy. However, since the polarization value is not very large and the PFM decays, the electrochemical effect has a non-negligible influence on the intrinsic ferroelectric performance.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call