Room‐Temperature Continuous Wave Lasing of Circular Defect in 2D Photonic Crystal (CirD) Laser with AlOx Cladding Layers Fabricated by One‐Step Dry Etching

Abstract

The use of photonic crystal (PhC) to form photonic bandgaps is expected to be applied to optical communications, and various studies have been conducted on this technology. In a previous study, the current‐injected Circular Defect (CirD) in 2D PhC laser is proposed. At that time, the dry‐etching process involves three steps. However, three‐step dry etching cannot be used to simultaneously form drainage trench and PhC air holes. In this study, a one‐step dry‐etching process for CirD lasers is conducted. Optical measurements are performed on the successfully fabricated samples. As a result, the first lasing of a CirD laser with a contact layer and an upper cladding layer fabricated with a one‐step dry etching is confirmed.