Abstract

In this study, Fe80Ce20 films were deposited on Si(100) and glass substrates using sputtering in a high-vacuum environment and subsequently heat-treated in a vacuum annealing furnace. The films, with thicknesses ranging from 10 nm to 50 nm, were annealed at temperatures of 100 °C, 200 °C, and 300 °C. The objective was to investigate the effects of film thickness and annealing temperature on the structural, surface energy, and magnetic properties of the material. X-ray diffraction (XRD) analysis confirmed the crystalline nature of both Si(100)/Fe80Ce20 and Glass/Fe80Ce20 films. Atomic force microscopy (AFM) revealed a smooth film surface that became rougher after annealing. Contact angle measurements indicated hydrophilic properties, with the highest surface energy observed in the as-deposited films due to a higher density of defects and grain boundaries. The hysteresis loop demonstrated exceptional soft magnetic properties and a high saturation magnetization (Ms) of approximately 2000 emu/cm³. Annealing at 100 °C altered the magnetic domain structure from a striped labyrinthine configuration to an aligned pattern. At higher annealing temperatures, the films exhibited grain growth, increased surface roughness, and new grain formation. Following annealing, the grains in the Fe80Ce20 films became larger, surface roughness increased, and the water contact angle increased, rendering the films more hydrophobic. The as-deposited films displayed the highest surface energy due to the high density of defects and grain boundaries. Increased surface roughness led to more grain boundary defects and irregularities, which served as pinning points for magnetic domain walls, thus increasing coercivity (Hc). Rough surfaces induced local stress fields, increased magnetic anisotropy, and decreased saturation magnetization. Thermal perturbations from higher annealing temperatures further disrupted the alignment of the magnetic moments, leading to a reduction in saturation magnetization.

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