Abstract
In order to clarify the effects of dislocation scattering on electron transport properties, temperature dependent (15-300 K) Hall-effect measurements were applied to the dislocated coalescent and dislocation-free non-coalescent ELO layers of InP prepared by the liquid phase epitaxy. The coalescent ELO layers contain a large number of dislocations, and the non-coalescent ELO layers are dislocation-free. Taking into account, the various electron scattering mechanisms in compound semiconductors, the temperature dependences of electron mobility were analyzed. It is shown that the dislocation scattering based on the charged dislocation line model is dominant transport mechanism in the dislocated coalescent ELO layers at low temperature.
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