Abstract
A new manufacturing method has been developed to prepare films composed of Sn-rich SnO 2 wires and rods using electrodeposition and subsequent plasma oxidation of pure Sn. The morphology of Sn-rich tin oxide grains varied significantly depending on the deposition current density. After a DC plasma oxidation process, the Sn, SnO, and SnO 2 phases were obtained as spherical grains when the previous electrodeposition was carried out at 6 A/dm 2 current density. The wire morphology was obtained only when the electrodeposition current was below 3 A/dm 2. The film produced at 1.5 A/dm 2 and then plasma oxidized showed wire morphology with single crystals of SnO 2 that formed in the (110) direction.
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