Robust transfer-printing method for perovskite films and nanostructures

Abstract

Metal halide perovskites, as a promising semiconductor material, have been successfully used in electroluminescent devices because of their desirable characteristics, such as good conductivity, high color purity, tunable bandgap, low cost and solution process ability. In the past few years, significant progress has been made in the development of high-efficiency perovskite light-emitting diodes (PeLEDs). These efficient PeLEDs are mainly achieved by sophisticated spin-coating methods, which can easily control the perovskite's composition, film thickness, morphology and crystallinity. However, with the continuous development of PeLEDs, commercial production problems have to be solved, such as large area production, high resolution patterning and substrate diversity, which are difficult for the current spin-coating process.