Robust hermetic packaging techniques for MEMS integrated microsystems.

Abstract

This work is the result of a Sandia National Laboratories LDRD funded fellowship at the University of Michigan. Although, guidance and suggestions were offered by Sandia, the work contained here is primarily the work of Brian H. Stark, and his advisor, Professor Khalil Najafi. Junseok Chae, Andrew Kuo, and their coworkers at the University of Michigan helped to record some of the data. The following is an abstract of their work. We have developed a vacuum packaging technology using a thick nickel film to seal MEMS structures at the wafer level. The package is fabricated in a three-mask process by electroplating a 40 micro-meter thick nickel film over an 8 micro-meter sacrificial photoresist that is removed prior to package sealing. Implementation of electrical feedthroughs in this process requires no planarization. The large release channel enables an 800x800 micro-meter package to be released in less than three hours. Several mechanisms, based upon localized melting and lead/tin solder bumping, for sealing the release channel have been investigated. We have also developed Pirani gauges, integrated with this package, which can be used to establish the hermeticity of the different sealing technologies. They have measured a sealing pressure of approximately 1.5 Torr. Our work differs from previous Pirani gauges in that we utilize a novel doubly anchored structure that stiffens the structural membrane while not substantially degrading performance in order to measure fine leak rates.