Robust Design Method of Multilayer Antireflection Coating for Organic Solar Cells

Abstract

We present an optimization algorithm for the design of multilayer antireflection (AR) coatings for organic photovoltaic (OPV) cells. When a set of available materials for the AR films is given, the proposed method allows for searching the globally optimized AR structure that maximizes the short-circuit current density (JSC) under simulated solar light illumination (AM 1.5). By applying this method to an OPV solar cell with a configuration of Al/P3HT:PCBM/MoO3/ITO, we demonstrated that JSC can increase by 7.5% with a 6-layer AR coating, consisting of MgF2, ZnS, and Al2O3. A notable feature of this method is that it can find not only the optimal solution, which maximizes JSC, but also the quasi-optimal solutions, which increase JSC to nearly maximum levels. We showed that the quasi-optimal solution may have higher robustness against deviations in film thicknesses, from their designated values. This method indicates the importance of practically useful, non-optimal solutions for designing AR coatings. The present method allows for extending the user’s choices and facilitates the realization of a practical design for an AR coating. key words: organic solar cell, multilayer antireflection coating, optimization, optical simulation