Abstract
Soft lithography methods are emerging as useful tools for high-resolution, three-dimensional patterning of polymers and nanoparticles. However, the low Young's modulus of the standard template material, poly(dimethylsiloxane) (PDMS), limits attainable resolution, fidelity, and alignment capability. While much research has been performed to find other more rigid polymer template materials, the high solvent and vapor permeability that is characteristic of PDMS is often sacrificed, preventing their use in those processes reliant on this property. In this work, a highly rigid, chemically robust, optically transparent and vapor-permeable poly(4-methyl-2-pentyne) template is developed. The combination of high rigidity and high vapor permeability enables high resolution patterning with simplified ink handling. This material was nanopatterned to create a template for patterning polymers and nanoparticles, achieving a resolution of better than 350 nm.
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