Abstract
We present studies of reactive ion etching of glasses modified by electric field applied to the glasses at elevated temperature. Voltage dependence of the thickness of the modified glass layers is revealed. Secondary ion mass spectrometry data are used to establish the relation between the ion etching rate of the electric field modified glasses and their local composition resulted from the modification. Using structured anodic electrodes allows formation of nanoscale relief structures on the glass surface because of the volume relaxation of the modified regions. This is thermal electric field imprinting procedure. It is shown that the reactive ion etching allows effective deepening the glass surface relief formed in the course of the imprinting. The reactive ion etching allows keeping a high lateral resolution of the surface relief formed in the imprinting. The formation of gratings with micron-scale periodicity is demonstrated.
Highlights
Glasses are widely used for the formation of devices for photonics and sensing, like phase diffraction gratings and microfluidic channels
thermal-electricfield imprinting (TEFI) is based on the modification of a glass at elevated temperature by shaped electric field (E-field) generated using a structured anodic electrode
The surface relief of the E-field modified glass, which results from the volume relaxation of the structurally/compositionally modified layer [3], presents height-scaled stamp of the anodic electrode
Summary
To cite this article: I Reduto et al 2018 J. Ser. 1124 051059 View the article online for updates and enhancements. This content was downloaded from IP address 193.167.108.65 on 20/02/2019 at 13:25. I Reduto, D Raskhodchikov, E Gangrskaia, V Kaasik, Yu Svirko, A Lipovskii Institute of Photonics, University of Eastern Finland, Joensuu 80101, Finland 2 St. Petersburg Academic University RAS, St. Petersburg 194021, Russia 3 Peter the Great St. Petersburg Polytechnic University, St. Petersburg 195251, Russia
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