Abstract
This paper presents results from a study of the nitriding of AISI-316 stainless steel by a low-pressure pure-nitrogen rf plasma at a temperature of 400°C. The nitrided layers were examined with scanning electron microscopy, X-ray diffraction, Rutherford backscattering and microhardness measurements. The results, when correlated with results from Langmuir-probe and spectroscopy measurements on the plasma, suggest that the density of excited neutral molecules is a more important influence on the nitriding kinetics than the density of ions in this particular process.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
