RF power absorption by plasma of a low-pressure inductive discharge

Abstract

This paper aims to analyze the mechanism of power absorption and to reveal, both experimentally and numerically, the basic factors determining the ability of plasma to absorb RF power. This is done by determining the plasma equivalent resistance value under different conditions in a low-pressure RF inductive discharge such as different antenna shape, working gas pressure, electron density, operating frequency and geometrical dimensions of the plasma source. Experimental and numerical results show that the plasma equivalent resistance changes non-monotonously with an increase in electron density, increases with an increase in neutral gas pressure, and that the maximum plasma equivalent resistance shifts toward higher electron densities when the operating frequency is increased.