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Abstract
In r.f. inductively coupled plasma (r.f.-ICP) nitriding, the nitriding of iron is prevented by the addition of hydrogen. However, in this study, the r.f.-ICP nitriding of iron surface was achieved by the application of negative bias voltage even in the presence of hydrogen. It seems that the effect of bias voltage overcomes the additive effect of hydrogen. Furthermore, the r.f.-ICP nitriding of SUS304 in the presence of hydrogen was investigated. At 550 °C, the nitriding was suppressed by the addition of hydrogen, as well as the nitriding of iron. However, the nitriding was promoted by the addition of hydrogen at 350 °C, and a hard nitrided layer was obtained. On the contrary, SUS304 was not nitrided without hydrogen at 350 °C.
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