Abstract
An R.F. assisted glow discharge cleaning system has been used on the DITE tokamak to remove low z impurities. Rapid cleaning of the system was achieved without baking following a major rebuild of the vacuum system and following subsequent exposures of the vacuum system to atmospheric pressure. Discharge cleaning with both pure hydrogen and with 1% added methane was used. However the ultimate impurity level could not be reduced below that corresponding to Z /sub eff/ = 2. Clean single crystal silicon samples were exposed in the glow discharges. Analysis of these samples by RBS showed that there were high deposition rates of carbon, oxygen and metals in both the hydrogen and the hydrogen plus methane discharges.
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