Abstract
Nanostructured Anti-Reflective (AR) surfaces have attracted a focused attention during the last few years and offer an alternative to AR coatings. Recent nanopatterning approaches have allowed fabrication of bioinspired nanostructured surfaces with unprecedented broadband and omnidirectional AR properties. However, nanofabrication methods face major challenges for reaching industrial maturity including high capital expenditure cost, scalability, reliability and adaptability of the technologies. Block copolymer (BCP) films provide one way to overcome some of these limitations by offering scalable and versatile masks to fabricate well-defined, uniform and tunable nanostructures on a variety of substrates at a modest price. This article aims at highlighting recent efforts for assembling such AR nanostructured surfaces with BCP films and the challenges yet to tackle prior to commercialization of the technology.
Highlights
Improvement of micro/nanofabrication tools and methods have enabled the nanostructuring of substrate surfaces directly, creating robust AR surfaces without coatings (Figures 1c, 1d).[18,19,20,21,22]
Overview.—Direct nanostructuring of the substrate surface offers several advantages over coatings in the fields of optics, eliminating intermediate layers between the substrate and its environment reduces the risk of releasing hazardous materials, and enables better control over the substrate/environment interaction
The current etch resistance and selectivity of masks obtained from Block copolymer (BCP) patterns, sufficient for etching high aspect-ratio structures in silicon,[41,43,64] need improvement for reaching similar capabilities on other substrates such as glass[41,65] or sapphire
Summary
Improvement of micro/nanofabrication tools and methods have enabled the nanostructuring of substrate surfaces directly, creating robust AR surfaces without coatings (Figures 1c, 1d).[18,19,20,21,22] This article aims to highlight recent efforts for fabrication of such AR nanostructured surfaces and the challenges remaining that should be addressed prior to commercialization. Etch contrast limited Fast, easy to fine-tune size and morphology, high aspect ratio structures Special equipment required of such masks could be considered as a critical factor for preparing high-performance AR surfaces and we anticipate its successful industrial applications.
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