Abstract
In recent years, new preparation technologies of ultra-hydrophilic TiO2 films have emerged in an endless stream, such as spray pyrolysis, electrostatic spinning, spray printing, micro-arc oxidation, pulsed laser deposition, atomic force deposition, ion beam deposition, etc. These new preparation technologies are able to control the surface chemical composition and surface structure of the thin film more precisely and to prepare the ideal superhydrophilic TiO2 coating. Among them, the rf sputtering method has important research significance for the repair and maintenance of TiO2/SiO2 composite coating. Nano TiO2 has excellent photocatalytic activity and superhydrophilicity, making it an important material for the preparation of high self-cleaning superhydrophilic coatings. However, the application of TiO2 photocatalysis requires UV light, and there is less than 5% UV light in sunlight, so the application of TiO2 photocatalytic performance is greatly limited. In addition, the surface hydrophilicity of TiO2 under light also has great problems. Therefore, improving the surface hydrophilic durability of TiO2 has become a key research point.
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