Review of the Versatile Patterning Methods of Ag Nanowire Electrodes

Abstract

To use Ag nanowires for various industries, it is crucial to develop an appropriate patterning method. There are various types of patterning methods, but there has been no comprehensive review discussing and summarizing them. This review paper provides an overview of the various patterning techniques of Ag nanowire electrodes, including photolithography, nanoimprint lithography, inkjet printing, electrohydrodynamic jet printing, and other emerging methods. These transparent electrodes have received significant attention due to their high transparency, low sheet resistance, and flexibility, making them ideal for applications such as flexible electronics, touch screens, and solar cells. Each patterning technique has its benefits and limitations, and its suitability depends on specific application requirements. Photolithography is a well-established technique that can achieve high-resolution patterns, while nanoimprint lithography is a low-cost and versatile method for large-area patterning. Inkjet printing and E-jet printing provide the advantages of high throughput, precise control, and the ability to print on different substrates. Stencil printing, laser direct writing, and electrospinning are emerging techniques that showing high potential for patterning Ag nanowire electrodes. The choice of patterning technique ultimately depends on various factors, such as resolution requirements, cost, substrate compatibility, and throughput.