Review of the Preparation and Structures of Si Nanowires, Ge Quantum Dots and Their Composites

Abstract

Because the motion of charge carriers in nanowires and quantum dots is restricted within nanoscale in two and three dimensions, respectively, both nanowires and quantum dots exhibit many excellent optoelectronic properties. Particularly, with the advantage of being compatible with Si integrated circuits, Silicon nanowires (SiNWs) and germanium quantum dots (GeQDs) have been extensively studied in the past few decades. In order to explore novel physical properties, the integration of SiNWs and GeQDs has attracted great attention recently. In this paper, recent researches on the preparation methods and structures of SiNWs, GeQDs and their composites are reviewed, respectively. The synthesis of SiNWs with random distribution and ordered arrays by using vapor–liquid–solid growth mechanism and metal-assisted chemical etching technique is firstly summarized. Some special structures of SiNWs are also discussed. Furthermore, the development of some novel structures of GeQDs for further improving their optical properties is reviewed. Finally, the growth mechanism and structure evolution of SiNWs/GeQDs composites are illustrated from the view of theory and experiment. The strain in Ge shell layers and SiNWs, the relationship between Ge growth mode and SiNW diameter, and the distribution of GeQDs on the radial and axial directions of SiNWs are discussed in detail. The research about the growth of SiNWs/GeQDs composite structures is in its early stage, so there are many questions that need to be resolved in future.