Review of Template Fabrication for Nanoimprint Lithography

Abstract

Nanoimprint lithography (NIL) is attracting attention as a low-cost and high-throughput method for printing nanometer-scale geometries, and has been included on the ITRS lithography roadmap at the 32 and 22 nm nodes. The template making is one of the most critical issues for the realization of NIL. The ultimate resolution of the patterns fabricated by NIL is primarily determined by the resolution of the features on the surface of the mold. Because of the 1X nature of NIL compared with 4X for photolithography, the 1X template fabrication is considered as the greatest challenge for NIL. Advances in NIL template fabrication processes are reviewed. The fabrication methods of 3D, large area and high resolution templates are currently critical requirements and challenges. As a result, new mold making methods should be further developed to meet the requirements from emerging market applications such as patterned media, photonic crystals and wire grid polarizers.