Abstract

We demonstrate reversible modulation of an insulator–metal transition (IMT) of a VO2 film grown on an Al2O3 (001) substrate through crystallization and re-amorphization of a chalcogenide germanium–antimony–telluride (Ge2Sb2Te5: GST) capping layer. After succeeding in the negative shift of IMT temperature (Tr) of the VO2 film through the crystallization of the GST layer accompanied by volume reduction, we performed re-amorphization of the crystalline GST by femtosecond laser irradiation. Under the optimized conditions of laser irradiation considering the penetration depth, re-amorphization of the GST layer was fully achieved, resulting in the shift-back of Tr toward a high-temperature side. Such a reversal of IMT through the crystallization and re-amorphization of the capping GST layer was demonstrated over two cycles. It was suggested that capping GST effectively induces interfacial strain modifications in the VO2 film underneath. Although the shifts in the IMT are still small, reversible modulation of IMT shown here will be beneficial for applications of VO2 films with controllable IMT.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.