Abstract
Thin films are prepared by rf-magnetron sputtering using a In2O3–ZnO powder target with a Zn content [Zn/(Zn+In)] of 33%. Their electrical and optical properties are strongly dependent on the oxygen concentration on the grain boundary surface of the films during heat treatment. The oxygen adsorption begins to occur around 400°C in air and the excess oxygen is almost desorbed around 400°C in vacuum. Therefore, the electrical and optical behaviors can be reversibly controlled by the desorption of the oxygen corresponding to the heat treatment environment.
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