Abstract

Optical microscopy with a diffraction limit cannot distinguish nanowires with sectional dimensions close to or smaller than the optical resolution. Here, we propose a scheme to retrieve the subwavelength cross-section of nanowires based on the asymmetric excitation of Bloch surface waves (BSWs). Leakage radiation microscopy is used to observe the propagation of BSWs at the surface and to collect far-field scattering patterns in the substrate. A model of linear dipoles induced by tilted incident light is built to explain the directional imbalance of BSWs. It shows the potential capability in precisely resolving the subwavelength cross-section of nanowires from far-field scattering without the need for complex algorithms. Through comparing the nanowire widths measured by this method and those measured by scanning electron microscopy (SEM), the transverse resolutions of the widths of two series of nanowires with heights 55 nm and 80 nm are about 4.38 nm and 6.83 nm. All results in this work demonstrate that the new non-resonant far-field optical technology has potential application in metrology measurements with high precision by taking care of the inverse process of light-matter interaction.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call