Abstract
Abstract Ruthenium oxide (RuO 2 ) films of different thicknesses have been cathodically deposited on titanium substrates under galvanostatic condition from aqueous acidic Ru(III)Cl 3 solution. The deposition conditions and structural properties of these films have been studied. The X-ray diffraction (XRD) and transmission electron microscopy (TEM) studies revealed that as-deposited RuO 2 film is nanocrystalline. The scanning electron microscopy (SEM) study showed that RuO 2 film is porous and the surface morphology changes with film thickness.
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