Response of Ni/4H-SiC Schottky barrier diodes to alpha-particle irradiation at different fluences

Abstract

Irradiation experiments have been carried out on 1.9×1016cm−3 nitrogen-doped 4H-SiC at room temperature using 5.4MeV alpha-particle irradiation over a fluence ranges from 2.6×1010 to 9.2×1011cm−2. Current–voltage (I–V), capacitance–voltage (C–V) and deep level transient spectroscopy (DLTS) measurements have been carried out to study the change in characteristics of the devices and free carrier removal rate due to alpha-particle irradiation, respectively. As radiation fluence increases, the ideality factors increased from 1.20 to 1.85 but the Schottky barrier height (SBHI–V) decreased from 1.47 to 1.34eV. Free carrier concentration, Nd decreased with increasing fluence from 1.7×1016 to 1.1×1016cm−2 at approximately 0.70μm depth. The reduction in Nd shows that defects were induced during the irradiation and have effect on compensating the free carrier. The free carrier removal rate was estimated to be 6480±70cm−1. Alpha-particle irradiation introduced two electron traps (E0.39 and E0.62), with activation energies of 0.39±0.03eV and 0.62±0.08eV, respectively. The E0.39 as attribute related to silicon or carbon vacancy, while the E0.62 has the attribute of Z1/Z2.