Abstract
The present manuscript aims to realize the effect of self-focusing on second-harmonic generation (SHG) by oblique incident laser beams in plasma. When an intense laser beam is obliquely incident on the plasma, it is resolved into reflected and refracted components, and resonant SHG is produced in the reflected component on account of the self-focusing of the incident laser. With the help of paraxial approximation, we have obtained a mathematical expression for the beam width parameter and for the normalized amplitude of the second harmonic. It has been observed that the amplitude of the second-harmonic pulse is significantly influenced by the intensity of the incident laser beam, the wiggler magnetic field, and the normalized plasma frequency. The analysis was performed for different values of the angle of incidence and laser parameters. The results show stronger self-focusing and, hence, efficient SHG when the angle of incidence is the critical angle.
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