Abstract
A new multicusp ion source developed by the Lawrence Berkeley Laboratory has been implemented into the ion projector of the Fraunhofer institute ISiT in Berlin. This source with low energy spread of ~ 2eV reduces chromatic aberration so that 50nm lines can be printed with an exposure dose of 0.3@mC/cm^2 of 75keV He^+ ions into standard 300nm thick DUV resist (Shipley UV II HS).
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