Abstract
This paper is devoted to the kinetics of nanocrystallization occurring in the FeCuNbSiB metallic glasses at the time of their annealing above the primary crystallization temperature. This process has been studied by means of the resistometric method, and the results obtained were analyzed in terms of the so-called Johnson-Mehl-Avrami equation. It shows that the nanocrystallization proceeds in two steps. The first, occurring within the initial range of the annealing time, is characterized by the Avrami exponent n ⋟ 1.5 , a value which corresponds to three-dimensional diffusion-controlled growth in the bulk with the pre-existing nuclei. Whereas the second, which takes place for longer annealing time, shows n⋟0.8 , a value reflecting a slowing down of the kinetics. The origin of this reduction is not clear. The activation energy of the first process has also been estimated giving E … 1.5 eV, a value much smaller than those hitherto reported.
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