Abstract
In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the stamps reproduce the membrane aperture patterns within ±10 nm and we validate such stamps by using them to fabricate metallic nanowires down to 100 nm in size.
Highlights
During the past 5 decades there has been a huge improvement in micro- and nano-fabrication processes
Several technologies have been proposed over the last few years as alternative nanolithographic methods to be used on large scale: multi-beam electron lithography, self-assembly based lithography, nanoimprint lithography (NIL) [1], nanostencil lithography [2], etc
In this paper we show an alternative solution, which consists of the use of an electron beam lithography (EBL)-made nanostencil to fabricate NIL stamps
Summary
During the past 5 decades there has been a huge improvement in micro- and nano-fabrication processes. Several technologies have been proposed over the last few years as alternative nanolithographic methods to be used on large scale: multi-beam electron lithography, self-assembly based lithography, nanoimprint lithography (NIL) [1], nanostencil lithography (nSL) [2], etc These two latter options offer a very high resolution (low minimum dimensions), choice of pattern size and shapes, and the costs can be pushed to a fraction of what the more standard lithography techniques mentioned in the previous paragraph require. In order to minimize costs it is required to develop an inexpensive way of producing stamps and stencils This might be very important for NIL, mostly in the cases where high pressures are utilized to imprint in the polymer, given the fact that stamps partially lose their properties after every use due to wearing. The lifetime of a stencil has been proven to be longer than a dozen times [14], providing a simple and cheap method for the fabrication of stamps for NIL
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