Abstract
Experimental verification of the theoretically derived resistivity correction factor F is presented. Factor F can be applied to a system consisting of a disk sample and a four-probe array. Measurements are made on isotropic graphite disks and crystalline ITO films. Factor F can correct the apparent variations of the data and lead to reasonable resistivities and sheet resistances. Here factor F is compared to other correction factors; i.e. FASTM and FJIS.
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