Resistive switching of two-dimensional NiAl-layered double hydroxides and memory logical functions

Abstract

Two-dimensional NiAl layered double hydroxides (LDHs) were synthesized by urea hydrolysis method. Considering its unique layered structure and high-speed carrier transfer channel, NiAl-LDHs were applied to the active layer of memristor through spin coating process. It is found that the Al/NiAl-LDHs/Al memristor exhibits unipolar resistance switching characteristics, which resistive switching mechanism is attributed to formation and fusing of conductive filaments controlled by oxygen vacancies. Based on this Al/NiAl-LDHs/Al memristor, a D-type latch was constructed. A memtransistor with Si/SiO2/graphene oxide (GO)/Al/NiAl-LDHs/Al structure was built by connecting Al/NiAl-LDHs/Al memristor in series on the drain electrode of GO transistor. The memtransistor exhibits excellent gate controllability and resistive switching characteristics. Combined with its characteristics, we used the memtransistor to build a D-trigger and verify its memory logical function. The result shows the great potential of layered bimetallic hydroxide materials in the field of resistance switching memory and memory computing.