Abstract
Resist heating effects on pattern shapes in electron beam lithography have been studied. The beam current density and dose partition dependences of the pattern shape are explained by comparison between the calculated spatial distribution of resist temperature and experimental resist pattern profiles. From direct heating of the resist using a tungsten heater during electron beam irradiation, the temperature effect on the resist sensitivity and pattern shape has been investigated. The pattern shape distortion is evaluated by a simulation considering the temperature effect.
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Schedule a callMore From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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