Abstract
The coercive field of soft magnetic ferromagnets is a structure-sensitive property and, in particular, is substantially affected by residual stresses. In the present study, the phase and structural states and residual stresses of the FeTiB and FeZrN films of various compositions, which were prepared by magnetron deposition on glass substrates and subsequent 1-h annealing at temperatures of 200–600 °C, were investigated by X-ray diffraction. The formation of a nanocrystalline structure is observed. It comprises different phases having different lattice parameters and unit-cell volumes and is characterized by high level of microstrains of grains as well; the microstrains predetermine the formation of high compressive stresses in the deposited films. As the annealing temperature increases, the compressive stresses decrease and, at certain temperatures, gradually transform into thermal tensile stresses, which are induced by the difference in the thermal expansion coefficients of the film and substrate. Thus, the heat treatment is the efficient way to improve the soft magnetic properties of the studied class of film materials produced by magnetron deposition.
Highlights
The development of new magnetic materials that meet the ever-growing requirements of modern magnetic electronics is the important problem of materials science
The phase and structural states and residual stresses of the FeTiB and FeZrN films of various compositions, which were prepared by magnetron deposition on glass substrates and subsequent 1-h annealing at temperatures of 200–600 ◦C, were investigated by X-ray diffraction
Information technology devices require soft magnetic film materials providing the combination of a maximum possible saturation induction (Bs > 2 T) and a low coercive field (Hc < 1 Oe)
Summary
The development of new magnetic materials that meet the ever-growing requirements of modern magnetic electronics is the important problem of materials science. Films of Fe-Ti-B and Fe-Zr-N system alloys with two-phases nanocrystalline structure (TiB2 boride or ZrN nitride particles located in the main soft magnetic αFe phase), which are produced by magnetron deposition followed by annealing (300–500 ◦C), are able to ensure the combination of high saturation induction (Bs ~ 2 T) and low coercive field (Hc < 1 Oe) [1,2]. Such a class of film materials is prepared by magnetron sputtering. Energy parameters of the magnetron sputtering, unlike those of other preparation methods available for film materials [3], ensure the conditions for the preparation of films in amorphous and nanocrystalline states, which comprise high-temperature and thermodynamically stable phases, in particular, TiB2 and ZrN.
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