Abstract

It was recently reported that nano residual films could be left on smooth substrates after the dewetting of partially wetting non-volatile liquids. In this work we clarify the criteria for the residual film to form and to maintain stable on the substrate. Atomic force microscopy imaging indicated that the residual film formation was dependent on the system wettability. The residual film was investigated in molecular dynamics simulations and the results were consistent to the experiments. The disjoining pressure played an important role in determining the film stability. The results provide important guidance for long-standing puzzles about trace liquid after dewetting.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.