Abstract
To test the hypothesis that no difference exists in the in situ levels of residual monomer of an autopolymerized acrylic resin, irrespective of the method of manipulation and polishing. Forty volunteers received the test specimens. The residual monomer was evaluated by means of gas chromatography using methylethylketone as extraction solvent. The samples of autopolymerized acrylic resin were submitted to two methods of manipulation--mass and addition--as well as to two types of polishing-mechanical and chemical. Four test groups were determined according to manipulation and polishing techniques: mass-mechanical; mass-chemical; addition-mechanical; addition-chemical. The data obtained were analyzed by the Student's t-test for paired samples as well as by analysis of variance. Residual methylmethacrylate was verified in high concentrations in the beginning of the testing as well as 24 hours after the test specimens had been worn. Mechanical polishing was associated with lower levels of residual monomer. The mass-mechanical group showed the lowest values. Mechanical polishing was associated with the lowest levels of residual monomer, and the lowest level of all occurred in mass-mechanical group. The hypothesis is rejected. Variations of residual polymer were associated with variations in the manipulation and polishing, but high concentrations of residual monomer were present in all groups. These concentrations were reduced after 24 hours.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Similar Papers
More From: The Angle Orthodontist
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.