Abstract
The aim of the paper is the research of dielectric membrane films obtained by reactive magnetron sputtering. Simulation of temperature distribution on the membrane structures of different elemental composition in the process of heating and cooling was carried out. The manufacturing results and the results of the properties study of dielectric membrane films are presented. The qualitative analysis of membrane films stability to destruction and deformation in the process of heating and cooling is given. Optimum element compositions and formation modes of dielectric films for sensitive elements of semiconductor gas sensors are determined.
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