Abstract
Data storage materials suffer from limited lifetime. Thus, there is a necessity for new data storage systems for archiving purposes. Systems based on chemical reactions such as the oxidation of corrosion-resistant metals are attractive candidates because they offer in principle very long-term stability. We have therefore investigated oxidation kinetics of Cr, Al, Ti, V, Zn, Ni, and Co. Here we present the results and discuss in detail fundamental issues of thin film oxidation, the limits of diffusion controlled oxidation, and possible ways to increase the oxidation rate constants. Co showed the highest oxidation rate constant (kp = 2.5 × 10−9 cm2/s at 540 °C) and is therefore considered as a promising candidate for data archiving.
Highlights
Current data storage technology is tuned for maximal storage capacity, fast writing, fast reading, and cost
We analyze possible data storage based on bits represented by stable compounds produced using chemical reactions of corrosion-resistant metals
The chemical reactions involved in writing the data have to be fast to be attractive for application purposes
Summary
Current data storage technology is tuned for maximal storage capacity, fast writing, fast reading, and cost. The approach for data-archiving materials is very simple: storing a bit in a spot by laser-induced chemical reactions, such as oxidation, sulphuration, or halogenation of a corrosion-resistant metal film.
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