Research status and application prospects of manufacturing technology for micro–nano surface structures with low reflectivity

Abstract

The light trapping surface of micro–nanostructure can significantly improve the performance of optical transmission and can greatly reduce the broadband domain of material surface reflectivity, which means the material surface absorptivity on wide-spectrum signal is enhanced. Several commonly used methods for manufacturing micro–nano surface of light trapping structure with low reflectivity are introduced first, including chemical etching, mechanical grooving, reactive ion etching, common long-pulse laser grooving, and ultra-fast pulse laser processing. This is followed by a comparison of the advantages and disadvantages of these methods. Among these methods, ultra-fast pulse laser processing is an ideal manufacturing technology for fabrication of light trapping structures. The research status of the micro–nano manufacturing technology of structured surfaces for light trapping with low reflectivity is reviewed, and emphasis is given to their application prospects. The research directions and trends of the micro–nano manufacturing technology of structured surfaces for light trapping with low reflectivity are summarized, and broad application prospects and research value in many fields, such as solar cells, solar water heater, building wave-absorbing materials, information acquisition of mechanized equipments, high-radiation heat exchange equipment, solar heating equipment, and solar air conditioner, are pointed out.