Abstract
Because of its small average droplet size, low carrier gas flow rate and the droplets not easy to splash etc, the ultrasonic atomizing spray technology is particularly suitable for making photoresist films. In order to get a reasonable spray scan interval, the parabolic deposition model was used to study the relationship between the spray overlap width and the photoresist film thickness and uniformity, and it can be concluded that the thickness of the film increases and the thickness variance of the film decreases oscillatorily along with the increasing of the spray overlap width.To obtain good uniformity of the photoresist film, the dimensionless overlap width should be at least greater than 0.15.
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