Abstract

To decrease the effect of carrier concentration on the skin depth, a new SPiN diode based on superlattice structure is discussed. Compared with traditional plasma diode, the intrinsic region of the SPiN diode is designed with SiGe/Si superlattices layer, and the thickness of the plasma islands is reduced from 80 μm to 5 μm, which dramatically reduced the design complexity and technical difficulty of microwave devices. Besides, a high-integration solid-state plasma inverted-F antenna based on this diode is also demonstrated in this paper. The resonant frequency of the inverted-F plasma antenna is in the order of 2.45 GHz, and the maximum gain reaches to 2 dB, which verify the effectiveness of the designed superlattice SPiN diode.

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