Research on Material Thickness and Material Properties with Application of Sensors

Abstract

With the wide application of thin film technology and optoelectronic devices, optical films have been widely used in the development and production of weapons and special devices for basic research. Faced with constantly updated status quo and development of optical thin film precision measurement of various parameters on a higher requirements, the film thickness is one of the key parameters in film design and manufacturing process. Particularly with the rapid development of nanoscale thin-film technology, the film thickness becomes a hot issue in the research field. For solid film thickness, the main measuring means are screw micrometer, microscopy, interferometry and polarization. Conventional Michelson interferometer can measure thin film thickness which is transparent and known, and the devices with sensors performance better.